Photoresist
Photoresist is a light-sensitive material used in the semiconductor industry to transfer a pattern onto a substrate. It is a crucial component in the photolithography process, which is used to create microelectronic devices such as integrated circuits and microelectromechanical systems (MEMS). The photoresist is applied to the substrate and exposed to light through a mask, which causes a chemical reaction that alters the solubility of the material. The unexposed areas are then removed using a developer solution, leaving behind a patterned layer that can be used for further processing. There are two main types of photoresist: positive and negative, which differ in their response to light. Positive photoresist becomes more soluble in the exposed areas, while negative photoresist becomes less soluble. The choice of photoresist depends on the specific requirements of the application.
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